JPH0193724U - - Google Patents
Info
- Publication number
- JPH0193724U JPH0193724U JP18983287U JP18983287U JPH0193724U JP H0193724 U JPH0193724 U JP H0193724U JP 18983287 U JP18983287 U JP 18983287U JP 18983287 U JP18983287 U JP 18983287U JP H0193724 U JPH0193724 U JP H0193724U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafers
- view
- quartz boat
- heat treatment
- quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010453 quartz Substances 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 13
- 239000004065 semiconductor Substances 0.000 claims description 10
- 235000012431 wafers Nutrition 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000000638 solvent extraction Methods 0.000 claims description 3
- 238000005192 partition Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18983287U JPH0193724U (en]) | 1987-12-14 | 1987-12-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18983287U JPH0193724U (en]) | 1987-12-14 | 1987-12-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0193724U true JPH0193724U (en]) | 1989-06-20 |
Family
ID=31480841
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18983287U Pending JPH0193724U (en]) | 1987-12-14 | 1987-12-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0193724U (en]) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1996028843A1 (fr) * | 1995-03-13 | 1996-09-19 | Tokyo Electron Limited | Appareil de traitement thermique |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55118631A (en) * | 1979-03-07 | 1980-09-11 | Fujitsu Ltd | Diffusion furnace for treatment of semiconductor wafer |
| JPS63102225A (ja) * | 1986-10-20 | 1988-05-07 | Deisuko Haitetsuku:Kk | 縦形半導体熱処理装置のウエ−ハボ−ト |
-
1987
- 1987-12-14 JP JP18983287U patent/JPH0193724U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55118631A (en) * | 1979-03-07 | 1980-09-11 | Fujitsu Ltd | Diffusion furnace for treatment of semiconductor wafer |
| JPS63102225A (ja) * | 1986-10-20 | 1988-05-07 | Deisuko Haitetsuku:Kk | 縦形半導体熱処理装置のウエ−ハボ−ト |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1996028843A1 (fr) * | 1995-03-13 | 1996-09-19 | Tokyo Electron Limited | Appareil de traitement thermique |